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David Le Clercq (; born 5 May 1977) is a Belgian former football player who played as a striker and is a coach.

Club career
A former youth international, Le Clercq was top scorer of the Belgian Third Division in 1999–00, having scored 18 goals for Germinal Beerschot. He was then promoted to the second division with Charleroi, but after only two matches he was sent to second division side Lierse. In his second season with Lierse he was sent off in the Europa League against Sheriff Tiraspol. After one season with Lierse, Le Clercq was released from his contract.

International career
Le Clercq was capped for the Belgium national under-21 football team, being one of the younger players in the team.

Career statistics

References

External links
Belgium Stats at Eu-Football

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I have the same problem as you. When I run the ChemCAD software, it instantly crashes. But I do not think this is because I have the 2007 version.
I think there is something wrong with the installation. If you have already installed, try to backup the data, install it again, and restore the backup.
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US 2009/0001212 A1 discloses a method for producing semiconductor devices having a stable threshold voltage, said method comprising the steps of: forming a first masking layer on a surface of a semiconductor substrate to define the locations where a dopant is to be implanted; implanting the dopant through the mask layer into the substrate to form a first implanted area; removing the masking layer; and forming a first dielectric layer on the first implanted area, wherein the first dielectric layer comprises a plurality of voids.
US 2008/0039594 A1 discloses a method for forming a field effect transistor (FET) on a semiconductor substrate including a semiconductor layer and a gate dielectric layer on the semiconductor layer wherein the method comprises: forming a mask layer on the gate dielectric layer; patterning and etching the mask layer to form a plurality of openings; annealing the substrate to form a barrier layer on the substrate within the openings; and subjecting the substrate to a nitrogen implantation process using the barrier layer as a partial blocking layer to form a source/drain region and a pocket.
U.S. Pat. No. 6,214,760 discloses a method for forming a gated field effect transistor (FET) on a semiconductor substrate, wherein the method comprises: forming a mask layer over a gate region of the semiconductor substrate and a gate dielectric region of the semiconductor substrate; patterning and etching the mask layer to form a plurality of openings in the mask layer; implanting a nitrogen-containing compound into the substrate through the openings to form an N-region, and forming a source/drain region in the substrate and connecting the source/drain region to the N-region.
U.S. Pat. No. 6,214,759 discloses

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CHEMCAD and CHEZ/CHEM/CMN are registered trademarks of Berkeley DFG, Inc. CHEMCAD. .
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